A Planar Magnetron Sputtering Cathode with Film Thickness Distribution Controllability
نویسندگان
چکیده
منابع مشابه
Film thickness distribution in magnetron sputtering
Of crucial importance to the thin film process engineer is an understanding of the parameters which affect the film thickness distributions which may be obtained from magnetron sources. This paper describes how variations in source design, target erosion and source-to-substrate distance affect observed uniformities from a magnetron source. A simple method of simulating magnetron sources using t...
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ژورنال
عنوان ژورنال: SHINKU
سال: 1982
ISSN: 0559-8516,1880-9413
DOI: 10.3131/jvsj.25.217